SPUTTERRING TARGET
Target Materials
Large sized target materials for liquid crystal
characteristics
High purity |
 |
materials
Cr, Al alloy, MoW, Ta, Mo
Target materials for semiconductor
characteristics
High purity |
 |
materials
W-Si, Mo-Si, Ti, W
Target materials for magnetic recording device
characteristics
High purity |
 |
materials
CoCr alloy(including Pt, Ta etc), Cr alloy(including Ti, Mo, W ),
Ni alloy(including Al. P)
Table of application and composition
| Field of products | Applications | Materials |
|---|---|---|
| Flat panel display | Electrode for TFT liquid crystal PDP electrode Refractory electrode Color filter |
Cr, Mo, Mo-W Al , Ta, Cu-Cr,Cu Al alloy,Ag alloy Al alloy, Cr , Ni alloy , Ta |
| Semiconductor | LSI electrode | MoSi WSi W Cu |
| LSI barrier metal | TiW Ti Ta Ta-X |
|
| Capacitor | Ru Ta Ti |
|
| Photo mask | Cr MoSi |
|
| Magnetic recording | Magnetic film | CoCrTa |
| Magnetic recording primary coating | CrMo Cr-X NiAl,NiAl+X NiP |
|
| Thin film magnetic head MR/GMR head |
NiFe IrMn |